Dr. Tsunehito Kohyama
at Lasertec Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 9 April 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 25 November 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Inspection, Image resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Wafer-level optics, Lithography, Metrology, Inspection, Optical metrology, Process control, Finite element methods, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Optics manufacturing, Defect inspection

Proceedings Article | 28 July 2008
Proc. SPIE. 7013, Optical and Infrared Interferometry
KEYWORDS: Telescopes, Mirrors, Fringe analysis, Interferometers, Cameras, Sensors, Far infrared, Charge-coupled devices, Spatial resolution, CCD image sensors

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