Tsuneo Kanda
Senior Engineer at Canon Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Polarization, Particles, Inspection, Distortion, Bridges, Scanning probe microscopy, Thin film coatings, Semiconducting wafers, Overlay metrology, Liquids

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Optical lithography, Lithographic illumination, Silicon, Wavefronts, Scanning electron microscopy, Photomasks, Semiconducting wafers

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Optical components, Optical design, Surface plasmons, Manufacturing, Wavefront aberrations, Lens design, Projection systems, Photomasks, Optics manufacturing, Temperature metrology

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Semiconductors, Optical imaging, Optical lithography, Image processing, Scanners, Diffusion, Wavefronts, Distortion, Projection systems, Nanoimprint lithography

Proceedings Article | 7 July 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Semiconductors, Sensors, Semiconductor manufacturing, Optical alignment, Sensor calibration, Semiconducting wafers, Overlay metrology

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