Dr. Tsuneo Terasawa
Senior Researcher at Shin-Etsu Chemical Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (91)

Proceedings Article | 29 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Target detection, Defect detection, Image processing, Inspection, Scanning electron microscopy, Signal processing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Target detection, Defect detection, Image processing, Inspection, Scanning electron microscopy, Data processing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Defect detection, Imaging systems, Sensors, Image processing, Inspection, Image acquisition, Image sensors, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Defect detection, Light scattering, Inspection, Surface roughness, CCD cameras, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Prototyping

SPIE Journal Paper | 24 June 2014
JM3 Vol. 13 Issue 02
KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, Phase measurement, Scanning probe microscopes, Optical lithography

Showing 5 of 91 publications
Conference Committee Involvement (6)
Photomask Japan 2011
13 April 2011 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
Showing 5 of 6 Conference Committees
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