Tsuneyuki Hagiwara
at Nikon Corp
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Diffraction, Monochromatic aberrations, Interferometers, Scanners, Manufacturing, Wavefronts, Image quality, Image sensors, Artificial intelligence, Diffraction gratings

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Semiconductors, Thin films, Lithography, Optical lithography, Interferometers, Pellicles, Finite element methods, Photomasks, Semiconductor manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Deep ultraviolet, Scanners, Zinc, Wavefronts, Wave propagation, Image sensors, Zernike polynomials, Artificial intelligence, Condition numbers

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Scanners, Error analysis, Finite element methods, Shape analysis, Critical dimension metrology, Semiconducting wafers, Tolerancing

SPIE Journal Paper | October 1, 2002
JM3 Vol. 1 Issue 03
KEYWORDS: Reticles, Calibration, Artificial intelligence, Optical lithography, Shape analysis, Semiconducting wafers, Distortion, Monochromatic aberrations, Projection systems, Differential equations

PROCEEDINGS ARTICLE | August 1, 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Interferometers, Distortion, Finite element methods, Photomasks, Semiconductor manufacturing, Semiconducting wafers, Process engineering

Showing 5 of 16 publications
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