Tsutomu Kikuchi
at Shibaura Mechatronics Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Image processing, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Photoresist processing, Optical damage, Ruthenium, EUV optics, Oxidation

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Semiconductors, Contamination, Optical properties, Particles, Photomasks, Velocity measurements, Spherical lenses, Mask cleaning, Mechatronics, Liquids

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Water, Particles, Manufacturing, Electronic components, Photomasks, Velocity measurements, Mask cleaning, Mechatronics, Liquids

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Quartz, Particles, Photomasks, Phase measurement, Velocity measurements, Cavitation, Mask cleaning, Mechatronics, Liquids

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top