Dr. Tsutomu Shoki
Project Leader at HOYA Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (27)

SPIE Journal Paper | September 1, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Reflectivity, Extreme ultraviolet, Nickel, Photomasks, Diffusion, Interfaces, Etching, Extreme ultraviolet lithography, Lithography, Thin films

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Carbon, Particles, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Ruthenium, Mask cleaning, Industrial chemicals

SPIE Journal Paper | April 1, 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Extreme ultraviolet, Inspection, Polishing, Photomasks, Extreme ultraviolet lithography, Glasses, Defect inspection, Silicon, Molybdenum, Wafer-level optics

PROCEEDINGS ARTICLE | March 14, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Electron beams, Inspection, Ion beams, Frequency modulation, Photomasks, Extreme ultraviolet, Fermium, Extreme ultraviolet lithography, Ruthenium

PROCEEDINGS ARTICLE | March 26, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Defect detection, Particles, Manufacturing, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

SPIE Journal Paper | April 1, 2010
JM3 Vol. 9 Issue 02
KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Image processing, Multilayers, Photoresist processing, Photovoltaics, Lithography, Extreme ultraviolet, Coating

Showing 5 of 27 publications
Conference Committee Involvement (9)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Showing 5 of 9 published special sections
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