Dr. Tsutomu Shoki
at HOYA Corp
SPIE Involvement:
Publications (28)

Proceedings Article | 30 September 2021 Presentation
Ikuya Fukasawa, Yohei Ikebe, Takeshi Aizawa, Tsutomu Shoki, Takahiro Onoue
Proceedings Volume 11855, 118550N (2021) https://doi.org/10.1117/12.2606239

SPIE Journal Paper | 1 September 2017
Yohei Ikebe, Hirofumi Kozakai, Tsutomu Shoki, Takahiro Onoue
JM3, Vol. 16, Issue 04, 041006, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041006
KEYWORDS: Reflectivity, Extreme ultraviolet, Nickel, Photomasks, Diffusion, Interfaces, Etching, Extreme ultraviolet lithography, Lithography, Thin films

Proceedings Article | 23 October 2015 Paper
Jaehyuck Choi, Jinsu Kim, Jeff Lowe, Davide Dattilo, Soowan Koh, Jun Yeol Choi, Uwe Dietze, Tsutomu Shoki, Byung Gook Kim, Chan-Uk Jeon
Proceedings Volume 9635, 96350C (2015) https://doi.org/10.1117/12.2197226
KEYWORDS: Extreme ultraviolet, Carbon, Photomasks, Extreme ultraviolet lithography, Ruthenium, Industrial chemicals, Particles, Scanning probe microscopy, Mask cleaning, Pellicles

SPIE Journal Paper | 1 April 2013 Open Access
Tsutomu Shoki, Masato Ootsuka, Minoru Sakamoto, Tatsuo Asakawa, Ryuuji Sakamoto, Hirofumi Kozakai, Kazuhiro Hamamoto, Takahiro Onoue, Toshihiko Orihara, Osamu Maruyama, Jun-Ichi Horikawa
JM3, Vol. 12, Issue 02, 021008, (April 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.021008
KEYWORDS: Extreme ultraviolet, Inspection, Polishing, Photomasks, Extreme ultraviolet lithography, Glasses, Defect inspection, Silicon, Molybdenum, Wafer-level optics

Proceedings Article | 14 March 2012 Paper
Takahiro Onoue, Kazuhiro Hamamoto, Toshihiko Orihara, Osamu Maruyama, Tsutomu Shoki, Junichi Horikawa
Proceedings Volume 8322, 832226 (2012) https://doi.org/10.1117/12.919745
KEYWORDS: Fermium, Extreme ultraviolet, Frequency modulation, Photomasks, Lithography, Inspection, Extreme ultraviolet lithography, Ruthenium, Ion beams, Electron beams

Showing 5 of 28 publications
Conference Committee Involvement (9)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Showing 5 of 9 Conference Committees
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