Dr. Tsuyoshi Amano
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (78)

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Imaging systems, Sensors, Image processing, Inspection, Electron microscopes, Image sensors, Photomasks, Extreme ultraviolet lithography, Defect inspection

SPIE Journal Paper | March 22, 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Inspection, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Line edge roughness, Image processing, Image resolution, Ultraviolet detectors, Photomasks, Electron microscopes

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Multilayers, Lithographic illumination, Defect detection, Light scattering, Inspection, CCD cameras, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Defect detection, Detection and tracking algorithms, Image processing, Inspection, Electron microscopes, Optical inspection, Image sensors, Data processing, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Signal detection

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Microscopes, Multilayers, Reflectivity, Image quality

SPIE Journal Paper | March 8, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Photomasks, Defect detection, Image sensors, Extreme ultraviolet lithography, Signal detection, Sensors, Defect inspection, Image processing, Image resolution

Showing 5 of 78 publications
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