Dr. Tsuyoshi Amano
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (78)

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Inspection, Extreme ultraviolet lithography, Photomasks, Electron microscopes, Defect detection, Image sensors, Image processing, Sensors, Defect inspection, Imaging systems

SPIE Journal Paper | 22 March 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Inspection, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Line edge roughness, Image processing, Image resolution, Ultraviolet detectors, Photomasks, Electron microscopes

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Light scattering, Multilayers, Defect detection, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Mirrors, EUV optics, CCD cameras

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Image sensors, Defect detection, Extreme ultraviolet, Electron microscopes, Data processing, Image enhancement, Optical inspection, Image processing, Signal detection, Detection and tracking algorithms

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Multilayers, Reflectivity, Microscopes, Image quality

Showing 5 of 78 publications
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