Tsuyoshi Furukawa
at JSR Micro Inc
SPIE Involvement:
Publications (9)

Proceedings Article | 9 April 2018 Presentation + Paper
Proceedings Volume 10586, 105860I (2018) https://doi.org/10.1117/12.2297113
KEYWORDS: Chemistry, Polymers, Printing, Etching, Optical lithography, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Dielectrics, Semiconducting wafers

SPIE Journal Paper | 28 August 2017
JM3, Vol. 16, Issue 03, 033506, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033506
KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

Proceedings Article | 5 May 2017 Presentation
Tsuyoshi Furukawa, Takehiko Naruoka, Hisashi Nakagawa, Hiromu Miyata, Motohiro Shiratani, Masafumi Hori, Satoshi Dei, Ramakrishnan Ayothi, Yoshi Hishiro, Tomoki Nagai
Proceedings Volume 10143, 101430X (2017) https://doi.org/10.1117/12.2258164
KEYWORDS: Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, High volume manufacturing, Photoresist processing, Lithography, Semiconductor manufacturing, Semiconductors, Line edge roughness

Proceedings Article | 13 April 2017 Presentation + Paper
Proceedings Volume 10146, 101460Q (2017) https://doi.org/10.1117/12.2260454
KEYWORDS: Etching, Directed self assembly, Polymethylmethacrylate, Critical dimension metrology, Picosecond phenomena, Oxides, Scanning electron microscopy, Optical lithography, Extreme ultraviolet, Metals

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 1014603 (2017) https://doi.org/10.1117/12.2260479
KEYWORDS: Directed self assembly, Plasma etching, Optical lithography, Etching, Logic, Lithography, Manufacturing, Nanofabrication, Silicon, Metals, Extreme ultraviolet, Line edge roughness, Optical alignment, Critical dimension metrology

Showing 5 of 9 publications
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