Tsuyoshi Furukawa
at JSR Micro Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | August 28, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

PROCEEDINGS ARTICLE | May 5, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | April 13, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Optical lithography, Polymethylmethacrylate, Etching, Metals, Scanning electron microscopy, Extreme ultraviolet, Directed self assembly, Picosecond phenomena, Critical dimension metrology

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Extreme ultraviolet, Directed self assembly, Plasma etching, Optical alignment, Critical dimension metrology, Line edge roughness, Nanofabrication

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Polymers, Chemistry, Photoresist materials, Atomic layer deposition, Extreme ultraviolet, Extreme ultraviolet lithography, Head-mounted displays, Photoresist processing, Back end of line

Showing 5 of 9 publications
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