Tsuyoshi Furukawa
at JSR Micro Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 9 April 2018 Presentation + Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | 28 August 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

Proceedings Article | 5 May 2017 Presentation
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Photoresist processing

Proceedings Article | 13 April 2017 Presentation + Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Optical lithography, Polymethylmethacrylate, Etching, Metals, Scanning electron microscopy, Extreme ultraviolet, Directed self assembly, Picosecond phenomena, Critical dimension metrology

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Extreme ultraviolet, Directed self assembly, Plasma etching, Optical alignment, Critical dimension metrology, Line edge roughness, Nanofabrication

Showing 5 of 9 publications
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