Dr. Tsuyoshi Kondo
at Hitachi High-Tech Corp
SPIE Involvement:
Publications (7)

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 1249612 (2023) https://doi.org/10.1117/12.2658280
KEYWORDS: Fourier transforms, Signal to noise ratio, Bridges, Inspection, Printing, Metrology, Film thickness, Extreme ultraviolet lithography, Atomic force microscopy, Defect detection

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530E (2022) https://doi.org/10.1117/12.2611002
KEYWORDS: Scanning electron microscopy, Inspection, Visualization, Signal to noise ratio, Particles, Optical lithography, Logic, Integrated circuits, Image processing, Image acquisition

Proceedings Article | 26 May 2022 Presentation + Paper
Gian Francesco Lorusso, Christophe Beral, Janusz Bogdanowicz, Danilo De Simone, Mahmudul Hasan, Christiane Jehoul, Alain Moussa, Mohamed Saib, Mohamed Zidan, Joren Severi, Vincent Truffert, Dieter Van den Heuvel, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Joey Hung, Roy Koret, Igor Turovets, Kit Ausschnitt, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12053, 120530O (2022) https://doi.org/10.1117/12.2614046
KEYWORDS: Fourier transforms, Signal to noise ratio, Metrology, Line width roughness, Scanning electron microscopy, Semiconducting wafers, Atomic force microscopy, Scatterometry, Extreme ultraviolet lithography, Image quality

Proceedings Article | 26 May 2022 Presentation + Paper
Mohamed Saib, Gian Francesco Lorusso, Anne-Laure Charley, Philippe Leray, Tsuyoshi Kondo, Hiroyuki Shindo, Yasushi Ebizuka, Naoma Ban, Masami Ikota
Proceedings Volume 12053, 120530V (2022) https://doi.org/10.1117/12.2613729
KEYWORDS: Data modeling, Principal component analysis, Metrology, Critical dimension metrology, Computer programming, Manufacturing, Data analysis, Scanning electron microscopy, Semiconducting wafers, Machine learning

SPIE Journal Paper | 5 November 2021 Open Access
JM3, Vol. 20, Issue 04, 044001, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.044001
KEYWORDS: Inspection, Scanning electron microscopy, Logic, Defect detection, Image processing, Signal to noise ratio, Visualization, Stochastic processes, Optical lithography, Computer programming

Showing 5 of 7 publications
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