Dr. Tuhin Guha Neogi Profile

Dr. Tuhin Guha Neogi

Member of Technical Staff

SPIE Involvement:

Author

Area of Expertise:

EUV, Self Aligned Double Patterning, SAQP, lithography, , Silicon photonics, Plasmonics , Waveguides , Modulators , detectors , Resonators

Publications (4)

Proceedings Article | 30 March 2017 Paper

Design space analysis of novel interconnect constructs for 22nm FDX technology

Tuhin Guha Neogi, Navneet Jain, Piyush Verma, David Permana, Andrey Lutich, Francois Weishbuch, Deepal Wehella-Gamage, Benoit Francois Claude Ramadout, Gowtham Vangara, Juhan Kim, Thomas Herrmann, Kai Sun, Katherina Babich, David Pritchard, Mahbub Rashed

Proceedings Volume 10148, 101480Z (2017) https://doi.org/10.1117/12.2258668

KEYWORDS: Monte Carlo methods, Diffusion, Statistical analysis, Lithography, Manufacturing, Diffractive optical elements, Optical lithography, Design for manufacturability, Silicon, Shape analysis

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Proceedings Article | 28 March 2017 Paper

Gate tie-down construct in the 22FDX technology: a silicon-based method for layout optimization

B. Ramadout, D. Wehella-Gamage, T. Staiger, H.-P. Moll, T.-Guha Neogi

Proceedings Volume 10148, 1014812 (2017) https://doi.org/10.1117/12.2258453

KEYWORDS: Diffractive optical elements, Electrical breakdown, Metals, Transistors, Diffusion, Silicon, Resistance, Semiconductors, Manufacturing, Design for manufacturability, Failure analysis

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Proceedings Article | 16 March 2015 Paper

EUV telecentricity and shadowing errors impact on process margins

D. Civay, E. Hosler, V. Chauhan, T. Guha Neogi, L. Smith, D. Pritchard

Proceedings Volume 9422, 94220Z (2015) https://doi.org/10.1117/12.2087639

KEYWORDS: Monte Carlo methods, Photomasks, Personal protective equipment, Extreme ultraviolet, Metals, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Reflectivity, Reliability

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Proceedings Article | 23 February 2010 Paper

Design of a multi-GHz SiGe HBT EO modulator

Shengling Deng, Tuhin Guha Neogi, J. McDonald, Joseph Novak, Z. Rena Huang

Proceedings Volume 7607, 760710 (2010) https://doi.org/10.1117/12.843269

KEYWORDS: Modulators, Modulation, Doping, Fourier transforms, Waveguides, Refractive index, Silicon, Switching, Plasmas, Germanium

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