Tung-Yaw Kang
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Reticles, Optical lithography, Scanners, Error analysis, Image registration, Photomasks, Double patterning technology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Defect detection, Inspection, Scanning electron microscopy, Printing, Photomasks, Computer aided design, Semiconducting wafers, Holons, Defect inspection

PROCEEDINGS ARTICLE | May 29, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Sensors, Particles, Inspection, Photomasks, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

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