Mr. Udo Triltsch Profile

Udo Triltsch

at Technische Univ Braunschweig

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Proceedings Article | 26 February 2008 Paper

TCAD tool for innovative MEMS and MOEMS: an all-in-one solution

U. Triltsch, S. Büttgenbach

Proceedings Volume 6882, 68820G (2008) https://doi.org/10.1117/12.773043

KEYWORDS: Etching, Microsystems, Microelectromechanical systems, TCAD, Computer aided design, 3D modeling, Device simulation, Data modeling, Process modeling, Microopto electromechanical systems

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In this paper we present a TCAD tool for MEMS, which combines process and layout design and provides links to behavioral modeling tools as well as to specialized modules for the optimized design of single components. There is a large amount of new fabrication technologies available which make the design of highly innovative MEMS and MOEMS possible. The design of such systems not only incorporates the layout of masks but also involves the composition of a flawless process chain. TCAD tools for MEMS available today do mostly not support the design of new fabrication processes together with behavioral simulation and layout design. Therefore, there is a need for a methodical approach to component-design, which leads an engineer from single components to a system ready for fabrication. Based on a conceptual model for the design process the latest version of the modular software environment BICEP³S (Braunschweigs Integrated CAD-Environment for Product Planning Process Simulation) is explained. The concept and data model of building blocks on component level, that act as knowledge containers for fabrication ready functional elements of microsystems, are shown in detail. As the detailed simulation of single process steps is crucial in fabrication oriented design cycles, we present an atomistic etch-simulator as one example for specialized simulation modules of our design environment.

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