Ulrich Hofmann
Founder/General Manager at GenISys GmbH
SPIE Involvement:
Area of Expertise:
Lithography , Data Preparation , Simulation , E-Beam Lithography , Proximity Effect Correction , Startups
Publications (13)

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Silicon, Photoresist materials, Photomasks, Critical dimension metrology, Molybdenum, Tolerancing, Photoresist developing

Proceedings Article | 26 March 2013 Paper
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Point spread functions, Modulation, Opacity, Monte Carlo methods, Photomasks, Beam shaping, Extreme ultraviolet lithography, Critical dimension metrology, Model-based design, Standards development

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Magnesium, Databases, Etching, Image processing, Image acquisition, Image resolution, Critical dimension metrology, Line edge roughness, Data conversion, Standards development

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Error analysis, Monte Carlo methods, Photomasks, Mask making, Critical dimension metrology, Semiconducting wafers

Showing 5 of 13 publications
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