Dr. Ulrich Klostermann
at Synopsys GmbH
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Temporal coherence, Particles, Nickel, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Data modeling, Polymers, Particles, Diffusion, 3D modeling, Photoresist processing, Process modeling, Chemically amplified resists

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Thin films, Lithography, Data modeling, Calibration, Polymers, Image processing, 3D modeling, Computational lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Electron beams, Metrology, Cadmium, Calibration, Image acquisition, Computer simulations, 3D modeling, Scanning electron microscopy, Critical dimension metrology

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Oxides, Visualization, Etching, Metals, Silicon, Manufacturing, Computer simulations, Signal processing, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Data modeling, Calibration, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing, Stochastic processes

Showing 5 of 23 publications
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