Dr. Ulrich Klostermann
at Synopsys GmbH
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 15 May 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Data modeling, Calibration, Photons, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Nanoimprint lithography, Line edge roughness, Stochastic processes

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Stochastic processes

Proceedings Article | 4 April 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Computer simulations, 3D modeling, Photomasks, Extreme ultraviolet, Computational lithography, Optical proximity correction, Photoresist processing, Performance modeling, Resolution enhancement technologies

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Temporal coherence, Particles, Nickel, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Data modeling, Polymers, Particles, Diffusion, 3D modeling, Photoresist processing, Process modeling, Chemically amplified resists

Showing 5 of 26 publications
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