Ulrich Strößner
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Electron beam lithography, Light sources, Metrology, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Airborne remote sensing, EUV optics, Plasma

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Artificial intelligence, Charge-coupled devices, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Particles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Airborne remote sensing

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Lithographic illumination, Scanners, Photomasks, Double patterning technology, Source mask optimization, Computational lithography, Optical aberrations, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Scanners, Physics, Printing, Photomasks, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Scanners, Scanning electron microscopy, Photomasks, Line width roughness, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Airborne remote sensing

Showing 5 of 12 publications
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