Ulrich Strößner
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Extreme ultraviolet, Photomasks, Manufacturing, Plasma, Extreme ultraviolet lithography, Airborne remote sensing, Light sources, Metrology, EUV optics, Electron beam lithography

Proceedings Article | 5 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Photomasks, EUV optics, Reticles, Projection systems, Optics manufacturing, Charge-coupled devices, Artificial intelligence

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet, Photomasks, Scanners, Extreme ultraviolet lithography, Reticles, Particles, Lithography, Metrology, Airborne remote sensing, Electromagnetic coupling

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photomasks, Double patterning technology, Scanners, Source mask optimization, Lithography, Computational lithography, Lithographic illumination, Semiconducting wafers, 193nm lithography, Optical aberrations

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Semiconducting wafers, Photomasks, Calibration, Image processing, Scanners, Printing, Photoresist processing, Lithography, Data modeling, Physics

Showing 5 of 12 publications
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