Ute Buttgereit
Senior Product Manger at Carl Zeiss SMT GmbH
SPIE Involvement:
Publications (49)

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11327, 113270D (2020) https://doi.org/10.1117/12.2552048
KEYWORDS: Photomasks, Calibration, Etching, Scanners, Lithography, SRAF, Scanning electron microscopy, Semiconducting wafers, Metrology, Optical lithography

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10451, 1045113 (2017) https://doi.org/10.1117/12.2281884
KEYWORDS: Defect detection, Defect inspection, Critical dimension metrology, Image analysis, Image processing, Statistical analysis, Tolerancing, Photomasks, Manufacturing, Reliability

Proceedings Article | 28 September 2017 Paper
Proceedings Volume 10446, 104460V (2017) https://doi.org/10.1117/12.2281886

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10147, 101470Y (2017) https://doi.org/10.1117/12.2258632
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Metrology, 3D modeling, Semiconducting wafers, Photoresist materials, Calibration, Wafer-level optics, Image processing, Scanners

Proceedings Article | 29 October 2014 Paper
Proceedings Volume 9235, 92351U (2014) https://doi.org/10.1117/12.2066169
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Photomasks, Printing, Calibration, Feedback loops, Metrology, Scanning electron microscopy, Image processing

Showing 5 of 49 publications
Conference Committee Involvement (3)
Photomask Technology
19 September 2006 | Monterey, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask Technology
14 September 2004 | Monterey, California, United States
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