Ute Buttgereit
Senior Product Manger at Carl Zeiss SMT GmbH
SPIE Involvement:
Conference Program Committee | Author
Publications (48)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Statistical analysis, Defect detection, Image processing, Manufacturing, Reliability, Image analysis, Photomasks, Critical dimension metrology, Tolerancing, Defect inspection

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Image processing, Scanners, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Metrology, Calibration, Image processing, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Feedback loops, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Metrology, Logic, Image processing, Image analysis, Printing, Photomasks, Computed tomography, Logic devices, Optical proximity correction, Critical dimension metrology

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Metrology, Logic, Signal attenuation, Control systems, Finite element methods, Photomasks, Critical dimension metrology, Neodymium, Semiconducting wafers, Polonium

Showing 5 of 48 publications
Conference Committee Involvement (3)
Photomask Technology
19 September 2006 | Monterey, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask Technology
14 September 2004 | Monterey, California, United States
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