Ute Buttgereit
Senior Product Manger at Carl Zeiss SMT GmbH
SPIE Involvement:
Publications (49)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Photomasks, Calibration, Etching, Scanners, Lithography, SRAF, Scanning electron microscopy, Semiconducting wafers, Metrology, Optical lithography

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Defect detection, Defect inspection, Critical dimension metrology, Image analysis, Image processing, Statistical analysis, Tolerancing, Photomasks, Manufacturing, Reliability

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Metrology, 3D modeling, Semiconducting wafers, Photoresist materials, Calibration, Wafer-level optics, Image processing, Scanners

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Photomasks, Printing, Calibration, Feedback loops, Metrology, Scanning electron microscopy, Image processing

Showing 5 of 49 publications
Conference Committee Involvement (3)
Photomask Technology
19 September 2006 | Monterey, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask Technology
14 September 2004 | Monterey, California, United States
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