Dr. Uwe Dersch
Senior R&D Engineer EUV Masks at Advanced Mask Technology Ctr
SPIE Involvement:
Publications (15)

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70280P (2008) https://doi.org/10.1117/12.793032
KEYWORDS: Extreme ultraviolet, Diffraction, Finite element methods, Photomasks, Scanning electron microscopy, Critical dimension metrology, Chemical elements, Cadmium, Scatterometry, Maxwell's equations

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69213R (2008) https://doi.org/10.1117/12.771923
KEYWORDS: Extreme ultraviolet, Scatterometry, Critical dimension metrology, Photomasks, Diffraction, Finite element methods, Multilayers, Extreme ultraviolet lithography, Reflectivity, Reflectometry

Proceedings Article | 18 June 2007 Paper
Proceedings Volume 6617, 66171A (2007) https://doi.org/10.1117/12.726159
KEYWORDS: Extreme ultraviolet, Diffraction, Scatterometry, Critical dimension metrology, Photomasks, Scattering, Light scattering, Finite element methods, Reflectometry, Reflectivity

Proceedings Article | 18 June 2007 Paper
Proceedings Volume 6617, 661718 (2007) https://doi.org/10.1117/12.726156
KEYWORDS: Diffraction, Extreme ultraviolet, Finite element methods, Photomasks, Scatterometry, Scatter measurement, Computer simulations, Extreme ultraviolet lithography, Scanning electron microscopy, Scattering

Proceedings Article | 5 April 2007 Paper
Thomas Marschner, Jan Richter, Uwe Dersch, Amit Moran, Ruthy Katz, David Chase, Reuven Falah, Thomas Coleman
Proceedings Volume 6518, 65181R (2007) https://doi.org/10.1117/12.712530
KEYWORDS: Photomasks, Line edge roughness, Computer aided design, Metrology, Signal processing, Critical dimension metrology, Line width roughness, Semiconducting wafers, Edge roughness, Scanning electron microscopy

Showing 5 of 15 publications
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