Dr. Uwe Dersch
Senior R&D Engineer EUV Masks at Advanced Mask Technology Ctr
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Author
Publications (15)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Diffraction, Cadmium, Scanning electron microscopy, Scatterometry, Finite element methods, Photomasks, Extreme ultraviolet, Critical dimension metrology, Chemical elements, Maxwell's equations

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Diffraction, Multilayers, Reflectivity, Scatterometry, Reflectometry, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | June 18, 2007
Proc. SPIE. 6617, Modeling Aspects in Optical Metrology
KEYWORDS: Diffraction, Scattering, Computer simulations, Scanning electron microscopy, Scatterometry, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scatter measurement

PROCEEDINGS ARTICLE | June 18, 2007
Proc. SPIE. 6617, Modeling Aspects in Optical Metrology
KEYWORDS: Diffraction, Scattering, Light scattering, Reflectivity, Scatterometry, Reflectometry, Finite element methods, Photomasks, Extreme ultraviolet, Critical dimension metrology

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Scanning electron microscopy, Signal processing, Photomasks, Line width roughness, Computer aided design, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Diffraction, Scattering, Numerical simulations, Computer simulations, Scatterometry, Finite element methods, Photomasks, Extreme ultraviolet, Critical dimension metrology, Scatter measurement

Showing 5 of 15 publications
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