Dr. Uwe A. Griesinger
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 21 June 2006 Paper
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Reticles, Logic, Data storage, Metals, Manufacturing, Photomasks, Optical proximity correction, SRAF, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beams, Opacity, Error analysis, Coating, Mask making, Critical dimension metrology, Line edge roughness, Photoresist processing, Vestigial sideband modulation, Chemically amplified resists

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Etching, Quartz, Inspection, Scanning electron microscopy, Printing, Photomasks, Phase measurement, Semiconducting wafers, Phase shifts

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Diffraction, Phase shifting, Optical lithography, 3D metrology, Photomasks, Optical proximity correction, 3D image processing, Resolution enhancement technologies, Phase shifts

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Phase shifting, Etching, Manufacturing, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Information operations, Phase shifts

Showing 5 of 12 publications
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