Dr. Uwe Stamm
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (50)

Proceedings Article | 27 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Modeling, Lithography, Sensors, Scanners, Manufacturing, Reflectivity, Lens design, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, EUV optics

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Scanners, Manufacturing, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Logic devices, Semiconducting wafers, Overlay metrology, Tin, Fiber optic illuminators

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Mirrors, Electrodes, Scanners, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Electrodes, Manufacturing, Laser applications, Xenon, Extreme ultraviolet, Integrated optics, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electrodes, Hydrogen, Manufacturing, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Prototyping, Plasma, Tin

Proceedings Article | 16 June 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Reflectivity, Magnetism, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Showing 5 of 50 publications
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