Dr. Vaibhav D. Deshpande
at
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Publications (1)

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Optical lithography, Etching, Image processing, Interfaces, Ions, 3D modeling, Monte Carlo methods, Plasma etching, Chemical elements, Semiconducting wafers, Bromine, Process modeling, Plasma

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