Dr. Vaishali Vohra
Strategic Account Manager at Dow Chemical Co
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Polymers, Photoresist materials, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Systems modeling, Photoresist developing

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Etching, Polymers, Image processing, Electroluminescence, Double patterning technology, Photoresist processing, Semiconducting wafers, Astatine

PROCEEDINGS ARTICLE | March 31, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Polymers, Water, Surface roughness, Surface properties, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Switches, Etching, Satellites, Polymers, Water, Capillaries, Digital watermarking, Photoresist processing, Adhesives

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical lithography, Distortion, Scanning electron microscopy, Optical vortices, Photomasks, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers, Spiral phase plates, Phase shifts

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Polymers, Silicon, Resistance, Scanning electron microscopy, Photoresist materials, Polymerization, Absorbance, Fluorine

Showing 5 of 7 publications
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