Valérie Rousset
at STMicroelectronics SA
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Microlens, Photomasks, Grayscale lithography, Chromium, Lithography, Photoresist processing, Annealing, Oxygen, Optical lithography, Atomic force microscopy

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Microlens, 3D modeling, Lithography, Calibration, Atomic force microscopy, Data modeling, Computer aided design, Photoresist materials, Photoresist processing, Polymers, Edge detection

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