Valerie Deuter
at Forschungszentrum Jülich GmbH
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Optical design, Phase shifting, Holography, Photomasks, Extreme ultraviolet, Computational lithography, Photoresist processing, Semiconducting wafers, Phase shifts

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