Dr. Vasanth Allampalli
at Coventor Inc
SPIE Involvement:
Publications (4)

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Etching, Metals, Photoresist materials, Capacitance, Transistors, Double patterning technology, Critical dimension metrology, Line edge roughness, Photoresist processing, Back end of line, Front end of line

SPIE Journal Paper | 13 September 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Etching, Optical lithography, Process modeling, Capacitors, Device simulation, 3D modeling, Polymers, Virtual reality, Reactive ion etching

Proceedings Article | 23 March 2016 Paper
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Lithography, Optical lithography, Spatial frequencies, Etching, Line width roughness, Deposition processes, Line edge roughness, Process modeling, Back end of line

Proceedings Article | 22 March 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Logic, Optical lithography, Capacitors, Etching, Polymers, Interfaces, 3D modeling, Software development, Directed self assembly, Transistors, Reactive ion etching, Virtual reality, Optimization (mathematics), Process modeling, Device simulation

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