Dr. Vasanth Allampalli
at Coventor Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Photoresist materials, Line edge roughness, Critical dimension metrology, Metals, Optical lithography, Double patterning technology, Capacitance, Photoresist processing, Front end of line, Back end of line, Etching, Transistors

SPIE Journal Paper | 13 September 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Etching, Optical lithography, Process modeling, Capacitors, Device simulation, 3D modeling, Polymers, Virtual reality, Reactive ion etching

Proceedings Article | 23 March 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Line edge roughness, Line width roughness, Etching, Lithography, Process modeling, Optical lithography, Back end of line, Deposition processes, Spatial frequencies

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Directed self assembly, Process modeling, Optical lithography, Capacitors, Lithography, Optimization (mathematics), Semiconductors, Software development, Interfaces, Transistors, Logic, Etching, Reactive ion etching, Device simulation, 3D modeling, Polymers, Virtual reality

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