Dr. Vassilios Constantoudis
Researcher at NCSR Demokritos - Nanometrisis p.c.
SPIE Involvement:
Author
Publications (38)

PROCEEDINGS ARTICLE | March 30, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Image processing, Materials processing, Image acquisition, Scanning electron microscopy, Image filtering, Extreme ultraviolet, Line width roughness, Double patterning technology, Line edge roughness, Material characterization

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Metrology, Image acquisition, Atomic force microscopy, Scanning electron microscopy, Time metrology, Finite element methods, Line width roughness, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Lithography, Metrology, Optical lithography, Statistical analysis, Etching, Image processing, Image analysis, Scanning electron microscopy, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Optical lithography, Error analysis, Inspection, Scanning electron microscopy, Process control, Line width roughness, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Image segmentation, Image processing, Scanning electron microscopy, Fractal analysis, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

Showing 5 of 38 publications
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