Dr. Vassilios Constantoudis
Researcher at NCSR Demokritos
SPIE Involvement:
Author
Publications (46)

Proceedings Article | 24 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Nanostructures, Feature extraction, Nanoimprint lithography, 3D metrology, Process control, Materials processing, Metrology, Error analysis, Scanning electron microscopy, Atomic force microscopy

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Data modeling, Line edge roughness, Denoising, Matrices, Scanning electron microscopy, Edge detection, Machine learning, Image processing, Detection and tracking algorithms, Algorithm development

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Scanning electron microscopy, Image processing, Statistical analysis, Modeling, Image segmentation, Nanoimprint lithography, Metrology, Computational modeling, Image acquisition, Computer simulations, Defect inspection

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Line edge roughness, Scanning electron microscopy, Denoising, Signal to noise ratio, Image processing, Data modeling, Image denoising, Edge detection, Interference (communication), Image filtering

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Line edge roughness, Edge roughness, Stochastic processes, Modeling, Line width roughness, Computational modeling, Optical proximity correction, Image segmentation, Critical dimension metrology, Manufacturing

Showing 5 of 46 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top