Dr. Vassilios Constantoudis
Researcher at NCSR Demokritos - Nanometrisis p.c.
SPIE Involvement:
Author
Publications (40)

SPIE Journal Paper | October 13, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Fractal analysis, Metrology, Edge roughness, Etching, Lithography, Image processing, Optical lithography, Image segmentation

SPIE Journal Paper | September 12, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Metrology, Line width roughness, Scanning electron microscopy, Digital filtering, Atomic force microscopy, Standards development, Semiconductors, Image acquisition, Image quality, Electron microscopes

PROCEEDINGS ARTICLE | March 30, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Image processing, Materials processing, Image acquisition, Scanning electron microscopy, Image filtering, Extreme ultraviolet, Line width roughness, Double patterning technology, Line edge roughness, Material characterization

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Metrology, Image acquisition, Atomic force microscopy, Scanning electron microscopy, Time metrology, Finite element methods, Line width roughness, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Lithography, Metrology, Optical lithography, Statistical analysis, Etching, Image processing, Image analysis, Scanning electron microscopy, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Image segmentation, Image processing, Scanning electron microscopy, Fractal analysis, Line edge roughness, Edge roughness

Showing 5 of 40 publications
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