Prof. Vasu Ramaswamy
Graduate Research Assistant at Univ of Wisconsin Madison
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Thin films, Reticles, Particles, Dielectrics, 3D modeling, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Analytical research

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Data modeling, Glasses, Particles, Dielectrics, Distortion, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Particle systems

Proceedings Article | 21 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Reticles, Data modeling, Glasses, Particles, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Zerodur, Thermal modeling

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Glasses, Particles, Error analysis, Distortion, Finite element methods, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Particle contamination

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