Dr. Venu Vellanki
at ASML San Jose
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Reticles, Metrology, Optical lithography, Data modeling, Scanners, Inspection, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Data modeling, Diffusion, Computer simulations, 3D modeling, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling, 3D image processing

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Data modeling, Reflection, Calibration, Silicon, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Metrology, Data modeling, Calibration, Scanners, Printing, Photomasks, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Diffractive optical elements, Cadmium, Data modeling, Birefringence, Scanners, Computational lithography, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Metrology, Diffractive optical elements, Data modeling, Calibration, Scanners, Micromirrors, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 15 publications
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