Viatcheslav V. Nesterenko
at Fraunhofer-IOF
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8077, Damage to VUV, EUV, and X-ray Optics III
KEYWORDS: Wafer-level optics, Carbon, Mirrors, Contamination, Gases, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotron radiation, EUV optics

PROCEEDINGS ARTICLE | March 26, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Molecules, Spectroscopic ellipsometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Mirrors, Contamination, X-rays, Silicon, Reflectivity, Bioalcohols, Extreme ultraviolet, Extreme ultraviolet lithography, Oxidation

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