Dr. Victor V. Boksha
VP Business Development at HPL Technologies Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Databases, Manufacturing, Inspection, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Light sources, Manufacturing, Design for manufacturing, Transistors, Field effect transistors, Optical proximity correction, Critical dimension metrology, Process modeling, Device simulation

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Human-machine interfaces, Databases, Manufacturing, Distortion, Design for manufacturing, Photomasks, Data conversion, Semiconducting wafers, Electronic design automation, Design for manufacturability

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Semiconductors, Lithography, Optical lithography, Silicon, Manufacturing, Design for manufacturing, Photomasks, Computer aided design, Semiconducting wafers, Electronic design automation

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 23 publications
Conference Committee Involvement (4)
Design and Process Integration for Microelectronic Manufacturing IV
23 February 2006 | San Jose, California, United States
Design and Process Integration for Microelectronic Manufacturing IV
3 March 2005 | San Jose, California, United States
Design and Process Integration for Microelectronic Manufacturing III
26 February 2004 | Santa Clara, California, United States
Cost and Performance in Integrated Circuit Creation
27 February 2003 | Santa Clara, CA, United States
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