Mr. Victor F. Bunze Profile

Victor F. Bunze

Director of EUV Marketing at Cutting Edge Optronics

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Publications (2)

Proceedings Article | 14 September 2001 Paper

Challenges for the 100-nm node

Harry Sewell, Pankaj Raval, Victor Bunze

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435685

KEYWORDS: Lithography, Semiconducting wafers, Reticles, Control systems, Wafer-level optics, Photomasks, Contamination control, Combined lens-mirror systems, Binary data, Vibration control

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Proceedings Article | 22 August 2001 Paper

Evaluation of the dual-exposure technique

Harry Sewell, Victor Bunze, Nicholas DeLuca, Diane McCafferty

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436758

KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Optical alignment, Distortion, Lithography, Double patterning technology, Wafer-level optics, Optical lithography, Lithographic illumination

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