Victor F. Bunze
Director of EUV Marketing at Cutting Edge Optronics
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Wafer-level optics, Lithography, Reticles, Control systems, Vibration control, Photomasks, Semiconducting wafers, Binary data, Contamination control, Combined lens-mirror systems

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Wafer-level optics, Lithography, Reticles, Optical lithography, Lithographic illumination, Distortion, Photomasks, Double patterning technology, Optical alignment, Semiconducting wafers

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