Mr. Victor Huang Profile

Victor Huang

Senior Manager at Pall Corp

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Author

Publications (5)

Proceedings Article | 27 March 2014 Paper

Effective resist profile control

Chen-Yu Liu, Chien-Wei Wang, Chun-Ching Huang, Ching-Yu Chang, Yao-Ching Ku

Proceedings Volume 9051, 90511Y (2014) https://doi.org/10.1117/12.2047144

KEYWORDS: Lithography, Photomasks, Polymers, Semiconducting wafers, Finite element methods, Photoresist processing, Defect inspection, Quantitative analysis, Organic materials, Silicon

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Proceedings Article | 19 March 2012 Paper

Contrast improvement with balanced diffusion control of PAG and PDB

S. Chen, L. Chang, Y. Chang, C. Huang, C. Chang, Y. Ku

Proceedings Volume 8325, 83250O (2012) https://doi.org/10.1117/12.915802

KEYWORDS: Polymers, Diffusion, Line width roughness, Optics manufacturing, Scattering, Printing, Semiconductor manufacturing, Resolution enhancement technologies, Inspection, Immersion lithography

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Proceedings Article | 4 December 2008 Paper

Advanced inspection methodologies for detection and classification of killer substrate defects

Aris Chen, Victor Huang, Sophie Chen, C. J. Tsai, Kenneth Wu, Haiping Zhang, Kevin Sun, Jason Saito, Henry Chen, Debbie Hu, Ming Li, William Shen, Uday Mahajan

Proceedings Volume 7140, 71400W (2008) https://doi.org/10.1117/12.804558

KEYWORDS: Semiconducting wafers, Inspection, Particles, Light scattering, Coating, Polishing, Scattering, Scanning electron microscopy, Crystals, Defect inspection

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Proceedings Article | 6 April 2007 Paper

Effect of novel rinsing material and surfactant treatment on the resist pattern performance

Victor Huang, C. Chiu, C. Lin, Ching Yu Chang, T. Gau, Burn Lin

Proceedings Volume 6519, 65193C (2007) https://doi.org/10.1117/12.713051

KEYWORDS: Line width roughness, Capillaries, Scanners, Scanning electron microscopy, Logic, Liquids, Semiconducting wafers, Skin, Image processing, Immersion lithography

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Proceedings Article | 20 March 2006 Paper

Dual antireflection layers for ARC/hard-mask applications

Victor Huang, T.S. Wu, Mars Yang, Francis Lin, Elvis Yang, T.H. Yang, K.C. Chen, Joseph Ku, C.Y. Lu

Proceedings Volume 6154, 61543Q (2006) https://doi.org/10.1117/12.656093

KEYWORDS: Reflectivity, Critical dimension metrology, Lithography, Etching, Interfaces, Optical lithography, Antireflective coatings, Dielectrics, Oxides, Photomasks

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