Dr. Victor H. Vartanian
Films Metrology Program Manager at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (10)

SPIE Journal Paper | February 27, 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Metrology, Copper, Silicon, X-rays, Semiconducting wafers, X-ray imaging, Etching, Scanning electron microscopy, Sensors, Metals

SPIE Journal Paper | February 12, 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Semiconducting wafers, Infrared microscopy, Wafer bonding, Microscopy, Objectives, Interfaces, Infrared imaging, Metrology, Silicon, Microscopes

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, 3D acquisition, Etching, Copper, Silicon, Optical microscopy, Inspection, Interferometry, Semiconducting wafers, Diffusion tensor imaging

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Oxides, Metrology, Etching, Silicon, Image resolution, Scanning electron microscopy, Scanning helium ion microscopy, 3D metrology, Critical dimension metrology

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Optical microscopes, Metrology, 3D acquisition, Defect detection, Polarization, Optical microscopy, 3D metrology, Critical dimension metrology, Defect inspection

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Ultraviolet radiation, Photoresist materials, Scatterometry, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 10 publications
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