Victoria Naipak
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Optical filters, Metrology, Polarization, Inspection, Scatterometry, Process control, Modeling and simulation, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Scatterometry, Process control, Overlay metrology

Proceedings Article | 30 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Modulation, Polarization, Image segmentation, Manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

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