Dr. Vidya Ramanathan
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Scatterometry, Process control, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Optical filters, Metrology, Polarization, Inspection, Scatterometry, Process control, Modeling and simulation, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Photovoltaics, Metrology, Diffractive optical elements, Detection and tracking algorithms, Optical properties, Etching, Scatterometry, Signal processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Scanners, Control systems, Scatterometry, Optical metrology, Time metrology, Signal processing, Measurement devices, Transistors, Critical dimension metrology, Semiconducting wafers, Model-based design, Instrument modeling

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Model-based design, Single crystal X-ray diffraction

Showing 5 of 11 publications
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