Dr. Vidya Ramanathan
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Overlay metrology, Scatterometry, Process control

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Diffractive optical elements, Metrology, Photovoltaics, Etching, Detection and tracking algorithms, Signal processing, Optical properties

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical metrology, Critical dimension metrology, Measurement devices, Time metrology, Lithography, Etching, Semiconducting wafers, Instrument modeling, Transistors, Model-based design, Signal processing, Scatterometry, Scanners, Data modeling, Control systems

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconducting wafers, Metrology, Finite element methods, Critical dimension metrology, Scanners, Single crystal X-ray diffraction, Scatterometry, Model-based design, Data modeling, Lithography

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top