Dr. Vidya Vaenkatesan
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 18 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Liquid phase epitaxy, Error analysis, Inspection, Photomasks, Extreme ultraviolet, Cadmium sulfide, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Wafer-level optics, Reticles, Metrology, Scanning electron microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, EUV optics

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Ions, 3D modeling, 3D metrology, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Reflection, Scanners, Coating, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 9 publications
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