Dr. Vidya Vaenkatesan
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 18, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Liquid phase epitaxy, Error analysis, Inspection, Photomasks, Extreme ultraviolet, Cadmium sulfide, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | September 26, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Wafer-level optics, Reticles, Metrology, Scanning electron microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Ions, 3D modeling, 3D metrology, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Reflection, Scanners, Coating, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Metrology, Optical lithography, Scanners, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Reticles, Deep ultraviolet, Etching, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

Showing 5 of 8 publications
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