Dr. Vijay Surla
at Univ of Illinois
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Chemical species, Sputter deposition, Particles, Electrons, Ions, Photomasks, Helium, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Sensors, Argon, Electrodes, Microchannel plates, Ions, Silicon, Diagnostics, Extreme ultraviolet, Plasma, Tin

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Contamination, Etching, Ions, Extreme ultraviolet, Plasma etching, Reactive ion etching, Chlorine, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Contamination, Sensors, Particles, Ions, Silicon, Oxygen, Extreme ultraviolet, Silicon carbide, Plasma

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Chemical species, Particles, Silicon, Photomasks, Extreme ultraviolet lithography, Helium, Semiconducting wafers, Atmospheric particles, Plasma

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