Mr. Vijaya Kumar Mathe Profile

Vijaya Kumar Mathe

at Royal Melbourne Institute of Technology

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Proceedings Article | 2 April 2004 Paper

Laser patterning of thin films of TiNiPd deposited on silicon substrate

Vijaya Mathe, Dinesh Sood, Jason Hayes

Proceedings Volume 5276, (2004) https://doi.org/10.1117/12.522911

KEYWORDS: Silicon films, Silicon, Crystals, Solids, Semiconductor lasers, Curium, Palladium, Nickel, Shape memory alloys, Thin films

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Patterned Ti-based shape memory alloy films have attracted considerable research effort in recent times owing to their favorable characteristics for potential applications as micro-actuators in microelectromechanical systems. Titanium-Nickel-Palladium (TiNiPd) shape memory alloy film can be used to fabricate micro actuators for high temperature applications. These films are to be patterned to realize the microactuators. We have made an attempt to laser pattern amorphous TiNiPd shape memory alloy films on a silicon substrate, deposited by DC-magnetron sputtering using a Ti₅₄Ni_36.8Pd_9.2 alloy target. These films were micromachined by KrF excimer laser induced ablation at 248nm. Two different mask patterns have been used, one having an array of squares and circular features and the other having lines of varying widths and pitch. Three types of film removal mechanisms were observed i) due to amorphous to crystalline phase transformation, ii) due to solid to liquid transition followed by crystallization and iii) removal of the film along with silicon substrate melting. These mechanisms of TiNiPd film removal from silicon substrate appear to be similar to the mechanisms of TiNi film removal from silicon substrate reported in the literature. This paper presents the dependence of TiNiPd material removal mechanisms and feature quality on laser parameters such as fluence, pulse repetition frequency and number of shots.

Proceedings Article | 13 November 2002 Paper

Patterning of thin films of TiNi deposited on silicon substrate

Vijaya Mathe, Dinesh Sood, Jason Hayes

Proceedings Volume 4936, (2002) https://doi.org/10.1117/12.471927

KEYWORDS: Silicon, Silicon films, Crystals, Laser ablation, Semiconductor lasers, Excimer lasers, Optical lithography, Solids, Shape memory alloys, Micromachining

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Actuators made from patterned Ti-based shape memory alloy films have potential applications in micro systems owing to their high mechanical output and other favourable characteristics. Micro fabrication techniques such as chemical etching and electrolytic photo etching have been used for patterning these alloy films. The latest trend is to use laser micromachining owing to its advantages in terms of non-contact processing, achievable resolution and pattern flexibility. Successful excimer laser micromachining of TiNi in the forms of as- rolled strips (bulk) and RF Sputter deposited, free - standing foils, with different combinations of laser parameters have been recently reported. However, sufficient data pertaining to laser micromachining of these alloy films deposited on silicon substrates are required for their applications to silicon based MEMS. We have attempted to micromachine TiNi shape memory alloy films on silicon substrate deposited by DC- magnetron sputtering using a Ti₅₄Ni₄₆ alloy target. These films were micromachined by KrF excimer laser induced ablation at 248nm. The dependence of TiNi material removal mechanisms and feature quality on laser parameters such as fluence, pulse repetition frequency and number of shots are presented.

Proceedings Article | 13 November 2002 Paper

Characterization of TiNi, TiNiPd thin films by ion beam analysis techniques

Vijaya Mathe, Dinesh Sood, Nick Dytlewski, Peter Evans

Proceedings Volume 4936, (2002) https://doi.org/10.1117/12.471925

KEYWORDS: Titanium, Oxygen, Nickel, Silicon films, Thin films, Palladium, Shape memory alloys, Contamination, Silicon, Sputter deposition

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Ti-based shape memory alloy (SMA) thin films have the potential to become high performance actuator materials for microelectromechanical systems. The major challenge in fabricating Ti-based SMA thin films is composition control, since a small compositional deviation can result in very large changes in the phase transformation temperatures. Owing to extreme reactivity of titanium, oxygen contamination is a major problem during the sputter deposition of TiNi and TiNiPd SMA thin films as it alters the Ni/Ti ratio. Oxygen as a contaminant has deleterious effects both on shape memory properties and mechanical properties of these alloys. Not much work in this field has been focussed on identification, determination and elimination of oxygen contamination. Rutherford Backscattering Spectrometry (RBS)is a useful technique for accurate determination of stoichiometry and depth profiling of these alloy films. RBS is less sensitive to light elements. For this reason RBS has been complemented by Heavy Ion Elastic Recoil Detection Analysis (HIERDA) for the determination of oxygen. TiNi and TiNiPd films were deposited by DC- Magnetron Sputtering on unheated Silicon substrates by using Ti_1.08Ni_0.92 and Ti_1.08 Ni _0.74 Pd _0.18 alloy targets. RBS measurements were carried out with 2 MeV He ions whereas HIERDA used 77 MeV I¹⁰⁺ ions with a ToF-E detector. It was found that oxygen contamination is almost negligible in TiNiPd films compared to TiNi films deposited under similar conditions. Palladium is effective as a catalyst in removing the oxygen from the deposition system resulting in reduced oxygen pick-up. This paper presents the stoichiometric analysis and depth profiling of these films by RBS and HIERDA technniques

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