Vikram L. Tolani
Program Manager at KLA Corp
SPIE Involvement:
Author
Publications (43)

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Analytics, Reticles, Metrology, Etching, Manufacturing, Inspection, Process control, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Scanners, Manufacturing, Inspection, Computer simulations, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Defect inspection

Proceedings Article | 26 October 2017 Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 5 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, Metrology, Databases, Manufacturing, Inspection, Computing systems, Photomasks, Operating systems, Semiconducting wafers, Defect inspection

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Deep ultraviolet, Calibration, Manufacturing, Image analysis, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 43 publications
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