Vikram L. Tolani
Program Manager at KLA Corp
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 26 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, Metrology, Databases, Manufacturing, Inspection, Computing systems, Photomasks, Operating systems, Semiconducting wafers, Defect inspection

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Deep ultraviolet, Calibration, Manufacturing, Image analysis, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Deep ultraviolet, Opacity, Calibration, Metals, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Deep ultraviolet, Inspection, Image analysis, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers, Double positive medium

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Defect detection, Manufacturing, Inspection, Image resolution, Photomasks, Image classification, SRAF, Resolution enhancement technologies, Classification systems, Defect inspection

Showing 5 of 41 publications
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