Dr. Vinay Goel Profile

Dr. Vinay Goel

V.P. Technology, CCS div. at Entegris, Inc.

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Proceedings Article | 25 March 2019 Presentation + Paper

Expanding the lithographer's toolkit to reduce variability: filtration considerations

V. Goel, A. Wu, J. Braggin

Proceedings Volume 10960, 1096017 (2019) https://doi.org/10.1117/12.2514965

KEYWORDS: Particles, Chemistry, Lithography, Adsorption, Polymers

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There are many points in the photochemical ecosystem where variability can be addressed with chemistry and hardware solutions. From the purification of resist components to the final post develop rinse, there are many points at which defects can be created or eliminated. As the possible combinations of chemistries increase to achieve ever-shrinking nodes, the portfolio of photochemical filtration to reduce defects, variability, and downtime must also grow.

Suppliers to OEMs (original equipment manufacturers) and photochemical manufacturers are constantly innovating to ensure their solutions address new defect challenges. In the 1980s, when the minimum feature size was approaching 1.0 μm, 0.2 μm filters were used to eliminate the largest particles in photochemical manufacturing. As the industry pursues the sub-7 nm node, conventional filtration technology is challenged to meet industry needs. Membrane pore size reduction alone is no longer a tenable approach to meet evolving process requirements, and creative approaches to eliminate defects must be developed to meet these challenges.

This overview will provide process engineers insight into the complexity of filtration to reduce defect variability and downtime. The many factors that impact filtration efficacy will be reviewed, including complete filter design, material selection, membrane morphology, wettability, and fluid dynamics. New technological approaches under consideration will be discussed. Data will be presented to demonstrate promise of these new approaches and where they could lead us in the future.

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