Dr. Vinayan C. Menon
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Metrology, Laser range finders, Silicon, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Electronic support measures, Overlay metrology

SPIE Journal Paper | October 25, 2013
JM3 Vol. 12 Issue 04
KEYWORDS: Semiconducting wafers, Electronic support measures, Overlay metrology, Optical alignment, Silicon, Photomasks, Lithography, Laser range finders, Scanners, Metrology

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Scanners, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Reticles, Metrology, Image processing, Scanners, Error analysis, Control systems, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Scanners, Error analysis, Electroluminescence, Photomasks, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Optical lithography, Defect detection, Manufacturing, Inspection, Control systems, Wafer inspection, Optical alignment, Semiconducting wafers, Defect inspection

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top