Dr. Vinayan C. Menon
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconducting wafers, Overlay metrology, Electronic support measures, Distortion, Optical alignment, Metrology, Photomasks, Lithography, Silicon, Laser range finders

SPIE Journal Paper | 25 October 2013
JM3 Vol. 12 Issue 04
KEYWORDS: Semiconducting wafers, Electronic support measures, Overlay metrology, Optical alignment, Silicon, Photomasks, Lithography, Laser range finders, Scanners, Metrology

Proceedings Article | 4 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Manufacturing, Control systems, Semiconductor manufacturing, Data modeling, Process control, Metrology

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Overlay metrology, Scanners, Semiconducting wafers, Reticles, Metrology, Optical alignment, Control systems, Photomasks, Image processing, Error analysis

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Critical dimension metrology, Tolerancing, Lithography, Photomasks, Scanners, Semiconducting wafers, Electroluminescence, Optical lithography, Error analysis, Reactive ion etching

Showing 5 of 8 publications
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