Vincent Arnoux
SPIE Involvement:
Publications (5)

Proceedings Article | 30 March 2017 Paper
Proceedings Volume 10147, 1014705 (2017)
KEYWORDS: Lithography, Optical proximity correction, Manufacturing, Process modeling, Design for manufacturing, Extreme ultraviolet, Data processing, Databases, Optical calibration, Model-based design, Optical lithography, Sensors, Standards development, Deep ultraviolet

Proceedings Article | 4 October 2016 Paper
Proceedings Volume 9985, 99851A (2016)
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730T (2011)
KEYWORDS: Lithography, Etching, Double patterning technology, Optical lithography, Critical dimension metrology, Resolution enhancement technologies, Photomasks, SRAF, Image processing, Logic

Proceedings Article | 1 October 2010 Paper
Proceedings Volume 7823, 782312 (2010)
KEYWORDS: Source mask optimization, Photovoltaics, Critical dimension metrology, Lithography, Photomasks, Optical proximity correction, Optical lithography, Resolution enhancement technologies, Metals, Visualization

Proceedings Article | 19 May 2008 Paper
F. Sundermann, F. Foussadier, T. Takigawa, J. Wiley, A. Vacca, L. Depre, G. Chen, S. Bai, J.-S. Wang, R. Howell, V. Arnoux, K. Hayano, S. Narukawa, S. Kawashima, H. Mohri, N. Hayashi, H. Miyashita, Y. Trouiller, F. Robert, F. Vautrin, G. Kerrien, J. Planchot, C. Martinelli, J. L. Di-Maria, V. Farys, B. Vandewalle, L. Perraud, J. C. Le Denmat, A. Villaret, C. Gardin, E. Yesilada, M. Saied
Proceedings Volume 7028, 70280U (2008)
KEYWORDS: Photomasks, Semiconducting wafers, Bridges, Scanning electron microscopy, Critical dimension metrology, Process modeling, Optical proximity correction, Reticles, Model-based design, Logic

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