Dr. Vincent Farys
Technical Coordinator at STMicroelectronics
SPIE Involvement:
Author
Publications (53)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Photomasks, Chromium, Microlens, 3D modeling, Atomic force microscopy, Grayscale lithography, Lithography, Photoresist processing, Diffraction, Microlens array

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Metrology, Scanning electron microscopy, Lithography, Data processing, Etching, Inspection, Process control

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Scanning electron microscopy, Image analysis, Image processing, Denoising, Critical dimension metrology, Optical proximity correction, Metrology, Image filtering, Process control, Optical lithography, Digital filtering, Sensors

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical proximity correction, Waveguides, Photomasks, Optical lithography, Photonic integrated circuits, Lithography, Manufacturing, Resolution enhancement technologies, SRAF, Photonic devices, Etching, Semiconducting wafers

SPIE Journal Paper | 27 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy

Showing 5 of 53 publications
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