Dr. Vincent Farys
Technical Coordinator at STMicroelectronics
SPIE Involvement:
Author
Publications (53)

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Diffraction, Microlens array, Chromium, 3D modeling, Atomic force microscopy, Microlens, Photomasks, Photoresist processing, Grayscale lithography

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Etching, Inspection, Scanning electron microscopy, Data processing, Process control

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Optical lithography, Sensors, Image processing, Digital filtering, Denoising, Image analysis, Scanning electron microscopy, Process control, Image filtering, Optical proximity correction, Critical dimension metrology

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Photonic devices, Optical lithography, Waveguides, Etching, Manufacturing, Photomasks, Photonic integrated circuits, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

SPIE Journal Paper | 27 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy

Showing 5 of 53 publications
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